Characterization of TiCN thin films deposited by Dc-Pulsed PACVD using methane precursor
Titanium carbonitride (TiCN) thin films were deposited on hot-work steel (DIN 1.2606) by plasma-assisted chemical vapor deposition (PACVD) and the influence of different CH4/ (CH4+N2) gas flow ratio, on the layer mechanical properties, were investigated. SEM studies indicated that the growth rate is...
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| Outros Autores: | , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2014
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| Assuntos: | |
| Texto completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392014000600037 |
| País: | Brasil |
| Oai: | oai:scielo:S1516-14392014000600037 |