Incorporation of N in the TiO2 Lattice Versus Oxidation of TiN: Influence of the Deposition Method on the Energy Gap of N-Doped TiO2 Deposited by Reactive Magnetron Sputtering

N-doped TiO2 can be deposited by reactive magnetron sputtering by two methods: incorporation of nitrogen particles in the TiO2 lattice or incorporation of oxygen particles in the TiN lattice (oxidation). This paper investigates both procedures by experimental and numerical methods in order to establ...

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Bibliographic Details
Main Author: Duarte,Diego Alexandre (author)
Other Authors: Massi,Marcos (author)
Format: article
Language:eng
Published: 2017
Subjects:
TiO2
nitrogen
doping
magnetron sputtering
modeling
Online Access:http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392017000200549
Country:Brazil
Oai:oai:scielo:S1516-14392017000200549

Internet

http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392017000200549

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