Lithographic mask defects analysis on an MMI 3 dB splitter
In this paper, we present a simulation study that intends to characterize the influence of defects introduced by manufacturing processes on the geometry of a semiconductor structure suitable to be used as a multimode interference (MMI) 3 dB power splitter. Consequently, these defects will represent...
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| Other Authors: | , , |
| Format: | article |
| Language: | eng |
| Published: |
2019
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| Subjects: | |
| Online Access: | http://hdl.handle.net/10400.21/10734 |
| Country: | Portugal |
| Oai: | oai:repositorio.ipl.pt:10400.21/10734 |