Amaral, Ana, Lavareda, G., Carvalho, C. Nunes de, André, V., Vygranenko, Yuri, Fernandes, M., & Brogueira, Pedro. (2019). Etchability Dependence of InO x and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions.
Citação do estilo Chicago (17ª ed.)Amaral, Ana, Lavareda, G, Carvalho, C. Nunes de, André, V, Vygranenko, Yuri, Fernandes, M, e Brogueira, Pedro. Etchability Dependence of InO X and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions. 2019.
Citação MLA (8ª ed.)Amaral, Ana, et al. Etchability Dependence of InO X and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions. 2019.
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