APA (7th ed.) Citation

Amaral, Ana, Lavareda, G., Carvalho, C. Nunes de, André, V., Vygranenko, Yuri, Fernandes, M., & Brogueira, Pedro. (2019). Etchability Dependence of InO x and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions.

Chicago Style (17th ed.) Citation

Amaral, Ana, Lavareda, G, Carvalho, C. Nunes de, André, V, Vygranenko, Yuri, Fernandes, M, and Brogueira, Pedro. Etchability Dependence of InO X and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions. 2019.

MLA (8th ed.) Citation

Amaral, Ana, et al. Etchability Dependence of InO X and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions. 2019.