Etchability dependence of InOx and ITO thin films by plasma enhanced reactive termal evaporation on structural properties and deposition conditions

Indium oxide (InOx) and indium tin oxide (ITO) thin films were deposited on glass substrates by plasma enhanced reactive thermal evaporation (PERTE) at different substrate temperatures. The films were then submitted to two etching solutions with different chemical reactivity: i) HNO3 (6%), at room t...

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Bibliographic Details
Main Author: Amaral, Ana (author)
Other Authors: Lavareda, Guilherme (author), Carvalho, Carlos Nunes de (author), Andre, Vania (author), Vygranenko, Yuri (author), Fernandes, Miguel (author), Brogueira, Pedro (author)
Format: article
Language:eng
Published: 2018
Subjects:
Transparent conductor
Thin film
Plasma deposition
Online Access:http://hdl.handle.net/10400.21/8800
Country:Portugal
Oai:oai:repositorio.ipl.pt:10400.21/8800

Internet

http://hdl.handle.net/10400.21/8800

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