Amaral, A., Lavareda, G., Carvalho, C. N. d., Andre, V., Vygranenko, Y., Fernandes, M., & Brogueira, P. (2018). Etchability dependence of InOx and ITO thin films by plasma enhanced reactive termal evaporation on structural properties and deposition conditions.
Citação do estilo Chicago (17ª ed.)Amaral, Ana, Guilherme Lavareda, Carlos Nunes de Carvalho, Vania Andre, Yuri Vygranenko, Miguel Fernandes, e Pedro Brogueira. Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Termal Evaporation on Structural Properties and Deposition Conditions. 2018.
Citação MLA (8ª ed.)Amaral, Ana, et al. Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Termal Evaporation on Structural Properties and Deposition Conditions. 2018.
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