APA (7th ed.) Citation

Amaral, A., Lavareda, G., Carvalho, C. N. d., Andre, V., Vygranenko, Y., Fernandes, M., & Brogueira, P. (2018). Etchability dependence of InOx and ITO thin films by plasma enhanced reactive termal evaporation on structural properties and deposition conditions.

Chicago Style (17th ed.) Citation

Amaral, Ana, Guilherme Lavareda, Carlos Nunes de Carvalho, Vania Andre, Yuri Vygranenko, Miguel Fernandes, and Pedro Brogueira. Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Termal Evaporation on Structural Properties and Deposition Conditions. 2018.

MLA (8th ed.) Citation

Amaral, Ana, et al. Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Termal Evaporation on Structural Properties and Deposition Conditions. 2018.