Citação norma APA

Amaral, A., Lavareda, G., Carvalho, C. N. d., Andre, V., Vygranenko, Y., Fernandes, M., & Brogueira, P. (2018). Etchability dependence of InOx and ITO thin films by plasma enhanced reactive termal evaporation on structural properties and deposition conditions.

Citação norma Chicago

Amaral, Ana, Guilherme Lavareda, Carlos Nunes de Carvalho, Vania Andre, Yuri Vygranenko, Miguel Fernandes, and Pedro Brogueira. Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Termal Evaporation on Structural Properties and Deposition Conditions. 2018.

Citação norma MLA

Amaral, Ana, et al. Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Termal Evaporation on Structural Properties and Deposition Conditions. 2018.

Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.