Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering
Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal tran...
| Autor principal: | |
|---|---|
| Outros Autores: | , , |
| Formato: | conferencePaper |
| Idioma: | eng |
| Publicado em: |
2006
|
| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/13970 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/13970 |