Effects of ion bombardment on properties of d.c. sputtered superhard (Ti, Si, Al)N nanocomposite coatings
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion current density in the substrate was varied by the" superimposition of an axially symmetric external magnetic field between the substrate and target. It was found that the variation of the magnetic f...
| Autor principal: | |
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| Outros Autores: | , , , , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2002
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/1800 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/1800 |