Simple general purpose ion beam deceleration system using a single electrode lens
Ion beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of μA level, providing the most wide implantation area pos...
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| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2018
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| Texto completo: | http://hdl.handle.net/10400.21/8270 |
| País: | Portugal |
| Oai: | oai:repositorio.ipl.pt:10400.21/8270 |