Nanocrystalline structure and hardness of thin films
W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes...
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| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2002
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| Texto completo: | http://hdl.handle.net/10316/4290 |
| País: | Portugal |
| Oai: | oai:estudogeral.sib.uc.pt:10316/4290 |
| Resumo: | W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. |
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