The oxidation behaviour of mixed tungsten silicon sputtered coatings

W-Si-N coatings were deposited by sputtering and their chemical composition, structure, thermal and oxidation behaviour were characterised. Si-containing films are essentially amorphous. W69Si31 film crystallises at 750 °C as [alpha]-W and W5Si3 phases whereas no significant structural transformatio...

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Bibliographic Details
Main Author: Louro, C. (author)
Other Authors: Cavaleiro, A. (author)
Format: article
Language:eng
Published: 1999
Subjects:
Oxidation resistance
Suicides
W-Si-N films
Tungsten silicide
Sputtering
Online Access:http://hdl.handle.net/10316/4321
Country:Portugal
Oai:oai:estudogeral.sib.uc.pt:10316/4321

Internet

http://hdl.handle.net/10316/4321

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