Electrochemical Characterization of the Influence of Scanning Number on the Self-assembled Monolayer Formed by Schiff Base

The influence of potential-scan number on the Schiff base self-assembled monolayer was probed by the Cyclic Voltammetry (CV) and Electrochemical Impedance Spectroscopy (EIS) techniques for the first time. The results showed that the charge transferring resistance (Rct) could be reduced with the pote...

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Bibliographic Details
Main Author: Ding,K. (author)
Other Authors: Wang,Q. (author), Jia,Z. (author), Tong,R. (author), Wang,X. (author)
Format: article
Language:eng
Published: 2003
Subjects:
Online Access:http://scielo.pt/scielo.php?script=sci_arttext&pid=S0872-19042003000300003
Country:Portugal
Oai:oai:scielo:S0872-19042003000300003
Description
Summary:The influence of potential-scan number on the Schiff base self-assembled monolayer was probed by the Cyclic Voltammetry (CV) and Electrochemical Impedance Spectroscopy (EIS) techniques for the first time. The results showed that the charge transferring resistance (Rct) could be reduced with the potential-scan, suggesting that the structure of the self-assembled monolayer was altered. Also, the relationship between the content of C=N group, represented approximately by the reduction electric charge (Qr), and the monolayer’s packing degree which was represented by the value of Rct, was described. Providing a new way to change the interface characterization is the main contribution of this paper.