Boron-doped nanocrystalline silicon thin films for solar cells

This article reports on the structural, electronic, and optical properties of boron-doped hydrogenated nanocrystalline silicon (nc-Si: H) thin films. The films were deposited by plasma-enhanced chemical vapour deposition (PECVD) at a substrate temperature of 150 degrees C. Crystalline volume fractio...

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Bibliographic Details
Main Author: Fathi, E. (author)
Other Authors: Vygranenko, Yuri (author), Vieira, Manuela (author), Sazonov, A. (author)
Format: article
Language:eng
Published: 2013
Subjects:
Thin solid films
Nanocrystalline silicon
PECVD
Solar cells
Microcrystalline silicon
Amorphous-silicon
Raman-spectroscopy
SI nanocrystals
P-layer
Thickness
Hydrogen
Silane
Window
Seed
Online Access:http://hdl.handle.net/10400.21/2112
Country:Portugal
Oai:oai:repositorio.ipl.pt:10400.21/2112

Internet

http://hdl.handle.net/10400.21/2112

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