Study of nanostructural bismuth oxide films prepared by radio frequency reactive magnetron sputtering

Bismuth oxide films were deposited onto quartz substrates by radio frequency reactive magnetron sputtering using a bismuth metal target. The substrate temperature was varied from room temperature to 500 oC. The state of Bi ions in the deposited films was characterized by XPS and the results showed t...

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Bibliographic Details
Main Author: Meng, Lijian (author)
Other Authors: Xu, Wei (author), Zhang, Qingyu (author), Yang, Tao (author), Shi, Shikao (author)
Format: article
Language:eng
Published: 2018
Subjects:
Bi2O3
Bismuth oxide
Thin film
Sputtering
Optical and structural properties
Online Access:http://hdl.handle.net/10400.22/10978
Country:Portugal
Oai:oai:recipp.ipp.pt:10400.22/10978

Internet

http://hdl.handle.net/10400.22/10978

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