Tantalum oxynitride thin films: Assessment of the photocatalytic efficiency and antimicrobial capacity

Tantalum oxynitride thin films have been deposited by reactive magnetron sputtering, using a fixed proportion reactive gas mixture (85% N<sub>2</sub> + 15% O<sub>2</sub>). To produce the films, the partial pressure of the mixture in the working atmosphere was varied. The char...

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Detalhes bibliográficos
Autor principal: Cristea, Daniel (author)
Outros Autores: Cunha, Luís (author), Gabor, Camelia (author), Ghiuta, Ioana (author), Croitoru, Catalin (author), Marin, Alexandru (author), Velicu, Laura (author), Besleaga, Alexandra (author), Vasile, Bogdan (author)
Formato: article
Idioma:eng
Publicado em: 2019
Assuntos:
tantalum oxynitride
magnetron sputtering
surface roughness
photocatalytic activity
antibiofilm capacity
Science & Technology
Texto completo:http://hdl.handle.net/1822/60125
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/60125

Texto Completo

http://hdl.handle.net/1822/60125

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