Outlier detection in lithography: benchmarking and the creation of a new algorithm
Internship Report presented as the partial requirement for obtaining a Master's degree in Data Science and Advanced Analytics
| Autor principal: | |
|---|---|
| Formato: | masterThesis |
| Idioma: | eng |
| Publicado em: |
2020
|
| Assuntos: | |
| Texto completo: | http://hdl.handle.net/10362/100950 |
| País: | Portugal |
| Oai: | oai:run.unl.pt:10362/100950 |