Visible and infrared photoluminescence from erbium-doped silicon nanocrystals produced by rf sputtering

Erbium-doped low-dimensional Si films with different microstructures were deposited by reactive magnetron sputtering on glass substrates by varying the hydrogen flow rate during deposition. Amorphous, micro- and nanocrystalline samples, consisting of Si nanocrystalls embedded in silicon-based matric...

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Bibliographic Details
Main Author: Cerqueira, M.F. (author)
Other Authors: Losurdo, M. (author), Monteiro, T. (author), Stepikova, M. (author), Soares, M.J. (author), Peres, M. (author), Alpuim, P. (author)
Format: article
Language:eng
Published: 1000
Subjects:
Doping (additives)
Erbium
Magnetron sputtering
Photoluminescence
Silicon
Spectroscopic ellipsometry
X ray diffraction
Online Access:http://hdl.handle.net/10773/6498
Country:Portugal
Oai:oai:ria.ua.pt:10773/6498

Internet

http://hdl.handle.net/10773/6498

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