High-performance ferroelectric-dielectric multilayered thin films for energy storage capacitors

Herein, the effect of the insertion of a thin dielectric HfO2:Al2O3 (HAO) layer at different positions in the Pt/0.5Ba(Zr0.2Ti0.8)O3–0.5(Ba0.7Ca0.3)TiO3 (BCZT)/Au structure on the energy storage performance of the capacitors is investigated. A high storage performance is achieved through the inserti...

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Detalhes bibliográficos
Autor principal: Silva, José Pedro Basto (author)
Outros Autores: Silva, João M. B. (author), Oliveira, Marcelo J. S. (author), Weingärtner, Tobias (author), Sekhar, Koppole C. (author), Pereira, Mário (author), Gomes, M. J. M. (author)
Formato: article
Idioma:eng
Publicado em: 2019
Assuntos:
charge coupling effect
dielectric capacitors
energy efficiency
energy storage density
ferroelectric–dielectric structures
Ciências Naturais::Ciências Físicas
Science & Technology
Texto completo:http://hdl.handle.net/1822/57393
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/57393

Texto Completo

http://hdl.handle.net/1822/57393

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