AlNxOy thin films deposited by DC reactive magnetron sputtering
AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were...
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| Outros Autores: | , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2010
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/10981 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/10981 |