Structural evolution of Ti-Al-Si-N nanocomposite coating

Ti–Si–Al–N films were prepared by rf reactive magnetron sputtering, in static and rotation modes, using a wide range of different deposition conditions, which created conditions to obtain Ti–Al–Si–N coatings with different structural arrangements. Films prepared below a critical nitrogen flow, under...

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Detalhes bibliográficos
Autor principal: Carvalho, S. (author)
Outros Autores: Rebouta, L. (author), Ribeiro, E. (author), Vaz, F. (author), Tavares, C. J. (author), Alves, E. (author), Barradas, N. P. (author), Rivière, J. P. (author)
Formato: article
Idioma:eng
Publicado em: 2009
Assuntos:
Ti-Al-Si-N
Superhard nanocomposites
Solid solution hardening
Magnetron sputtering
Science & Technology
Texto completo:http://hdl.handle.net/1822/27575
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/27575

Texto Completo

http://hdl.handle.net/1822/27575

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