Low substrate temperature deposition of amorphous and microcrystalline silicon films on plastic substrates by hot-wire chemical vapor deposition
Amorphous and microcrystalline silicon films were deposited by radio-frequency plasma enhanced chemical vapor deposition (rf-PECVD) and hot-wire chemical Vapor deposition (HW-CVD) on plastic (polyethylene terephthalate-PET) at 100 degrees C and 25 degrees C. Structural properties of these films were...
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| Outros Autores: | , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2000
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/5551 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/5551 |