Low substrate temperature deposition of amorphous and microcrystalline silicon films on plastic substrates by hot-wire chemical vapor deposition

Amorphous and microcrystalline silicon films were deposited by radio-frequency plasma enhanced chemical vapor deposition (rf-PECVD) and hot-wire chemical Vapor deposition (HW-CVD) on plastic (polyethylene terephthalate-PET) at 100 degrees C and 25 degrees C. Structural properties of these films were...

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Bibliographic Details
Main Author: Alpuim, P. (author)
Other Authors: Chu, V. (author), Conde, J. P. (author)
Format: article
Language:eng
Published: 2000
Subjects:
Transitors
Online Access:http://hdl.handle.net/1822/5551
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/5551

Internet

http://hdl.handle.net/1822/5551

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