Influence of hydrogen plasma thermal treatment on the properties of ZnO:Al thin films prepared by dc magnetron sputtering

ZnO:Al transparent and electrically conductive thin films were deposited on glass surfaces by d.c. pulsed magnetron sputtering from an AZOY (ZnO ¼ 97.88 mol%, Al2O3 ¼ 2 mol%, Y2O3 ¼ 0.12 mol%) target. In order to study the influence of sputtering pressure on the optical and electrical properties of...

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Detalhes bibliográficos
Autor principal: Castro, Maria Freire Flores Vieira (author)
Outros Autores: Cerqueira, M. F. (author), Rebouta, L. (author), Alpuim, P. (author), Garcia, Cibeli Navarro Belletti (author), Júnior, G. L. (author), Tavares, C. J. (author)
Formato: article
Idioma:eng
Publicado em: 2014
Assuntos:
Thin films
TCO
Aluminum-doped zinc oxide
Hydrogen treatment
Electrical properties
Sputtering
Ciências Naturais::Ciências Físicas
Science & Technology
Texto completo:http://hdl.handle.net/1822/32723
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/32723

Texto Completo

http://hdl.handle.net/1822/32723

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