Synthesis, structural and mechanical characterization of sputtered tungsten oxide coatings

Tungsten oxide coatings were deposited without substrate bias by DC reactive magnetron sputtering of a tungsten target using oxygen as reactive gas. By tuning the partial pressure of oxygen (pO2/pAr) between 0 and 4, the oxygen content of the films was changed from 0 to 75 at.%. The structure of the...

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Bibliographic Details
Main Author: Parreira, N. M. G. (author)
Other Authors: Carvalho, N. J. M. (author), Cavaleiro, A. (author)
Format: article
Language:eng
Published: 2006
Subjects:
Tungsten oxide
Reactive sputtering
Structural properties
Mechanical properties
Online Access:http://hdl.handle.net/10316/4224
Country:Portugal
Oai:oai:estudogeral.sib.uc.pt:10316/4224

Internet

http://hdl.handle.net/10316/4224

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