Physical and morphological characterization of reactively magnetron sputtered TiN films

The present paper reports the influence of growth conditions on the properties of TiN thin films deposited by rf reactive magnetron sputtering in the low-pressure range. The effects of rf power at the Ti target and the negative bias voltage at the substrate in the morphology, structure, electrical r...

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Detalhes bibliográficos
Autor principal: Vaz, F. (author)
Outros Autores: Machado, P. (author), Rebouta, L. (author), Mendes, J. A. (author), Lanceros-Méndez, S. (author), Cunha, L. (author), Nascimento, Sérgio M. C. (author), Goudeau, Ph. (author), Rivière, J. P. (author), Alves, E. (author), Sidor, A. (author)
Formato: article
Idioma:eng
Publicado em: 2002
Assuntos:
Magnetron sputtering
Rf power
TiN films
Science & Technology
Texto completo:http://hdl.handle.net/1822/3621
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/3621

Texto Completo

http://hdl.handle.net/1822/3621

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