Compositional, optical and electrical characteristics of SiOx Thin films deposited by reactive pulsed DC magnetron sputtering

The influence of O<sub>2</sub> flow rate on the compositional, optical and electrical characteristics of silicon oxide (SiO<i><sub>x</sub></i>) thin films (<i>x</i> < 2) were studied in this work. The SiO<i><sub>x</sub></i> t...

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Detalhes bibliográficos
Autor principal: Carneiro, Joaquim O. (author)
Outros Autores: Machado, Filipe (author), Rebouta, L. (author), Vasilevskiy, Mikhail (author), Lanceros-Méndez, S. (author), Teixeira, Vasco (author), Costa, Manuel F. M. (author), Samantilleke, A. P. (author)
Formato: article
Idioma:eng
Publicado em: 2019
Assuntos:
pulsed DC magnetron sputtering
silicon oxide
Urbach tail
I-V characteristics
Ciências Naturais::Ciências Físicas
Science & Technology
Texto completo:http://hdl.handle.net/1822/61309
País:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/61309

Texto Completo

http://hdl.handle.net/1822/61309

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