APA (7th ed.) Citation

Alpuim, P., Chu, V., & Conde, J. P. (2003). Electronic and structural properties of doped amorphous and nanocrystalline silicon deposited at low substrate temperatures by radio-frequency plasma-enhanced chemical vapor deposition.

Chicago Style (17th ed.) Citation

Alpuim, P., V. Chu, and J. P. Conde. Electronic and Structural Properties of Doped Amorphous and Nanocrystalline Silicon Deposited at Low Substrate Temperatures by Radio-frequency Plasma-enhanced Chemical Vapor Deposition. 2003.

MLA (8th ed.) Citation

Alpuim, P., et al. Electronic and Structural Properties of Doped Amorphous and Nanocrystalline Silicon Deposited at Low Substrate Temperatures by Radio-frequency Plasma-enhanced Chemical Vapor Deposition. 2003.