Alpuim, P., Chu, V., & Conde, J. P. (2003). Electronic and structural properties of doped amorphous and nanocrystalline silicon deposited at low substrate temperatures by radio-frequency plasma-enhanced chemical vapor deposition.
Citação do estilo Chicago (17ª ed.)Alpuim, P., V. Chu, e J. P. Conde. Electronic and Structural Properties of Doped Amorphous and Nanocrystalline Silicon Deposited at Low Substrate Temperatures by Radio-frequency Plasma-enhanced Chemical Vapor Deposition. 2003.
Citação MLA (8ª ed.)Alpuim, P., et al. Electronic and Structural Properties of Doped Amorphous and Nanocrystalline Silicon Deposited at Low Substrate Temperatures by Radio-frequency Plasma-enhanced Chemical Vapor Deposition. 2003.
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