Structural evolution in ZrNxOy thin films as a function of temperature

Single-layered zirconium oxynitride (ZrNxOy) thin films have been deposited on steel substrates, at a constant temperature of 300 °C, by radiofrequency (rf) reactive magnetron sputtering of a pure Zr target in an argon-oxygen-nitrogen atmosphere. The variation of the flow rate of the reactive gases...

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Detalhes bibliográficos
Autor principal: Cunha, L. (author)
Outros Autores: Vaz, F. (author), Moura, C. (author), Rebouta, L. (author), Carvalho, P. (author), Alves, E. (author), Cavaleiro, A. (author), Goudeau, Ph. (author), Rivière, J. P. (author)
Formato: article
Idioma:eng
Publicado em: 2006
Assuntos:
Zirconium oxynitride
PVD coatings
Decorative coatings
Heat treatment
Texto completo:http://hdl.handle.net/10316/4230
País:Portugal
Oai:oai:estudogeral.sib.uc.pt:10316/4230
Descrição
Resumo:Single-layered zirconium oxynitride (ZrNxOy) thin films have been deposited on steel substrates, at a constant temperature of 300 °C, by radiofrequency (rf) reactive magnetron sputtering of a pure Zr target in an argon-oxygen-nitrogen atmosphere. The variation of the flow rate of the reactive gases enabled changes in the composition and structure of the films. X-ray diffraction (XRD) and glancing incidence X-ray diffraction (GIXRD) were used to study the as-deposited films and their structural changes during or after heat treatment, from 400 to 900 °C, in controlled atmosphere and in vacuum.

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