Strain dependence electrical resistance and cohesive strength of ITO thin films deposited on electroactive polymer

Transparent, conducting, indium tin oxide (ITO) films have been deposited, by pulsed dc magnetron sputtering, on glass and electroactive polymer (poly(vinylidene fluoride)-PVDF) substrates. Samples have been prepared at room temperature by varying the oxygen partial pressure. Electrical resistivity...

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Bibliographic Details
Main Author: Rebouta, L. (author)
Other Authors: Rubio-Peña, L. (author), Oliveira, C. (author), Lanceros-Méndez, S. (author), Tavares, C. J. (author), Alves, E. (author)
Format: article
Language:eng
Published: 2010
Subjects:
Tensile test
ITO
Cohesive strength
Crack onset strain
Electroactive polymers
Science & Technology
Online Access:http://hdl.handle.net/1822/61340
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/61340
Description
Summary:Transparent, conducting, indium tin oxide (ITO) films have been deposited, by pulsed dc magnetron sputtering, on glass and electroactive polymer (poly(vinylidene fluoride)-PVDF) substrates. Samples have been prepared at room temperature by varying the oxygen partial pressure. Electrical resistivity around 8.4 x 10(-4) Omega cm has been obtained for films deposited on glass, while a resistivity of 1.7 x 10(-3) Omega cm has been attained in similar coatings on PVDF. Fragmentation tests were performed on PVDF substrates with thicknesses of 28 mu m and 110 mu m coated with 40 nm ITO layer. The coating's fragmentation process was analyzed and the crack onset strain and cohesive strength of ITO layers were evaluated.

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