Elastic properties of (Ti,Al,Si) N nanocomposite films

ŽTi,Al,Si.N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents in the range 2 11 at.% and Al contents between 4 and 19 at.%. Samples prepared in rotation mode Žthree magnetrons. presented densities between 4.0 and 4.6 g cm3, while samples prepared in static mode...

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Bibliographic Details
Main Author: Carvalho, S. (author)
Other Authors: Vaz, F. (author), Rebouta, L. (author), Schneider, D. (author), Cavaleiro, A. (author), Alves, E. (author)
Format: article
Language:eng
Published: 2001
Subjects:
Online Access:http://hdl.handle.net/1822/27549
Country:Portugal
Oai:oai:repositorium.sdum.uminho.pt:1822/27549