Elastic properties of (Ti,Al,Si) N nanocomposite films
ŽTi,Al,Si.N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents in the range 2 11 at.% and Al contents between 4 and 19 at.%. Samples prepared in rotation mode Žthree magnetrons. presented densities between 4.0 and 4.6 g cm3, while samples prepared in static mode...
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| Outros Autores: | , , , , |
| Formato: | article |
| Idioma: | eng |
| Publicado em: |
2001
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| Assuntos: | |
| Texto completo: | http://hdl.handle.net/1822/27549 |
| País: | Portugal |
| Oai: | oai:repositorium.sdum.uminho.pt:1822/27549 |