Study of vanadium doped ZnO films prepared by dc reactive magnetron sputtering at different substrate temperatures
ZnO films doped with vanadium (ZnO:V) have been prepared by dc reactive magnetron sputtering technique at different substrate temperatures (RT–500 C). The effects of the substrate temperature on ZnO:V films properties have been studied. XRD measurements show that only ZnO polycrystalline structure h...
Autor principal: | |
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Outros Autores: | , |
Formato: | article |
Idioma: | eng |
Publicado em: |
2014
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Assuntos: | |
Texto completo: | http://hdl.handle.net/10400.22/3227 |
País: | Portugal |
Oai: | oai:recipp.ipp.pt:10400.22/3227 |